Andover, MA – February 5, 2020 – MKS Instruments, Inc. (NASDAQ: MKSI), a global provider of technologies that enable advanced processes and improve productivity, has announced the Ophir® PE50U-DIFH-C Pulse Energy Sensor at SPIE Photonics West 2020.
Designed for use with high power pulsed lasers operating in demanding conditions, the sensor features special materials that can measure UV radiation down to 193nm, high repetition rates up to 10KHz, and high energy densities up to 1J/cm2 at 193nm and 2J/cm2 above 240nm.
Ideal for use in medical, semiconductor, and scientific research applications, the PE50U-DIFH-C energy sensor operates over a wide range of wavelengths, power levels, and repetition rates. It is calibrated at 193nm, 248nm, 355nm, 532nm, 1064nm, 2100nm, and 2940nm to ensure the highest levels of accuracy. It has a 35mm aperture and can measure energies from 10µJ to 10J. A special diffuser delivers the highest energy density damage threshold available, up to 90J/cm2 for ms pulses.